(주)와이엔디케이

광학 코팅 기술

Ion Beam Coating System

System Model UNIVAC-1200
Process Chamber Ø1200×H1080
Pumping System Diffusion 22”×2sets
Mechanical booster Pump 1,200㎥h-1
Oil Rotary Pump 300㎥h-1
Meissner Trap Polycold
Substrate Carrier Calotte Diameter 1,150mm
Substrate Heating Halogen Heater Up to 250℃
Evaporation Source Electron Beam Source 10kw
Thermal Source 5kw
Substrate Treatment Ion Source 4kw
Thin Film Thickness
Monitioring
Quartz Crystal Thickness Monitoring SQM
Optical Thickness Monitoring(optional) OPM
Utility Power 3ph 380/220V
Freequency AC 50/60Hz
Power 90kw(Max)
Water Pressure 2 ~ 4kgf/ ㎠
Air Pressure 5 ~ 6kgf/ ㎠
Floor Load Weight 4,000kgs(approx)

A Processing Chamber

B System Controller

C Electron Beam Power supply

D Ion beam power supply

E High vacuum pump

F Low vacuum pump

G Water vapor cryocooler