광학 코팅 기술
Ion Beam Coating System




System Model | UNIVAC-1200 | |
---|---|---|
Process Chamber | Ø1200×H1080 | |
Pumping System | Diffusion | 22”×2sets |
Mechanical booster Pump | 1,200㎥h-1 | |
Oil Rotary Pump | 300㎥h-1 | |
Meissner Trap | Polycold | |
Substrate Carrier | Calotte Diameter | 1,150mm |
Substrate Heating | Halogen Heater | Up to 250℃ |
Evaporation Source | Electron Beam Source | 10kw |
Thermal Source | 5kw | |
Substrate Treatment | Ion Source | 4kw |
Thin Film Thickness Monitioring |
Quartz Crystal Thickness Monitoring | SQM |
Optical Thickness Monitoring(optional) | OPM | |
Utility | Power | 3ph 380/220V |
Freequency | AC 50/60Hz | |
Power | 90kw(Max) | |
Water Pressure | 2 ~ 4kgf/ ㎠ | |
Air Pressure | 5 ~ 6kgf/ ㎠ | |
Floor Load Weight | 4,000kgs(approx) |

A Processing Chamber
B System Controller
C Electron Beam Power supply
D Ion beam power supply
E High vacuum pump
F Low vacuum pump
G Water vapor cryocooler
